Magnetic Mount Double-Tank Etch Cell

Double tank cell

About Magnetic Mount Double-Tank Etch Cell

This is a horizontally mounted, double-tank cell typically used for anodization of Si-wafers with electrolyte backside contact. It consists of two polyether ether ketone (PEEK) gas-tight chambers each equipped with sapphire wafer serving as window for illumination allowing light-assisted porous Si formation. It well fits aqueous (FKM/EPDM O-Rings) and organic solvent (FFKM O-Rings) electrolyte requirements. The Si substrate is mounted in between these chambers and sealed with O-rings under magnetic mount (a screw version is available on request). The preparation of a whole porous Si substrate with this cell is possible at one simple etching step, assuring high reproducibility.

Specification

  • nominal exposure area: 1 cm2 (other values on request)
  • minimum electrolyte volume: 2×10 mL
  • maximum electrolyte volume: 2×15 mL
  • electrode plug diameter: 6 mm
  • recommended Si-wafer size: 25 mm x 25 mm

Product includes

  • 2 x lid
  • 2 x chamber
  • 2 x window holder
  • 2 x sapphire window
  • 2 x set of screws
  • 2 x pillar
  • 2 x plug

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